The first DRIP Conference took place in Montpellier, France, in 1985. Since then, the event has been held every two years at renowned research centers around the world, bringing together scientists and engineers from both academia and industry.
Over the decades, DRIP has evolved into a leading international forum dedicated to the study of defects in semiconductors — both point and extended — investigated using a wide range of detection, identification, and imaging techniques.
The conference provides a unique platform for the exchange of knowledge and experience in material growth, processing, and manufacturing technologies, as well as their correlation with the presence and behavior of defects.
The upcoming edition of the DRIP Conference, to be held in Warsaw, Poland, will highlight the latest advances in analyzing, controlling, and understanding the influence of defects on material properties, reliability, and overall device performance.
We are thrilled to announce an open contest for designing the new logo of the DRIP Conference! This initiative offers a unique opportunity for creative minds to help shape the visual identity of our international scientific community.
The winning design will become the official logo of future DRIP conferences and will be featured on all related materials. Detailed submission guidelines and deadlines will be announced soon.
Stay tuned for more information!
The 21st DRIP Conference is organized jointly by leading Polish scientific institutions engaged in advanced semiconductor research and technology.
