We are pleased to announce that the contest for the new DRIP Conference logo is now open. We invite participants to submit their original designs and help shape the new visual identity of the conference.
The winning design will become the official logo of the DRIP 21 conference and may also be used in future editions of the conference.
Logo submissions should be sent to logo@drip21.pl no later than 30 June 2026.
Detailed rules, technical requirements, and submission conditions are available in the regulations.
The first DRIP Conference took place in Montpellier, France, in 1985. Since then, the event has been held every two years at renowned research centers around the world, bringing together scientists and engineers from both academia and industry.
Over the decades, DRIP has evolved into a leading international forum dedicated to the study of defects in semiconductors — both point and extended — investigated using a wide range of detection, identification, and imaging techniques.
The conference provides a unique platform for the exchange of knowledge and experience in material growth, processing, and manufacturing technologies, as well as their correlation with the presence and behavior of defects.
The upcoming edition of the DRIP Conference, to be held in Warsaw, Poland, will highlight the latest advances in analyzing, controlling, and understanding the influence of defects on material properties, reliability, and overall device performance.
The 21st DRIP Conference is organized jointly by leading Polish scientific institutions engaged in advanced semiconductor research and technology.
