We are pleased to announce that the competition for the new DRIP Conference logo has been resolved. The winning design was created by Igor Prozheev. We warmly thank all participants for their time, creativity and commitment.
The logo translates the conference theme into a compact visual identity: the missing central atom represents a vacancy, while the red detection frame highlights the recognition and imaging of a defect. Its outer silhouette recalls a semiconductor wafer and subtly forms the letter D.
The first DRIP Conference took place in Montpellier, France, in 1985. Since then, the event has been held every two years at renowned research centers around the world, bringing together scientists and engineers from both academia and industry.
Over the decades, DRIP has evolved into a leading international forum dedicated to the study of defects in semiconductors - both point and extended - investigated using a wide range of detection, identification, and imaging techniques.
The conference provides a unique platform for the exchange of knowledge and experience in material growth, processing, and manufacturing technologies, as well as their correlation with the presence and behavior of defects.
The upcoming edition of the DRIP Conference, to be held in Warsaw, Poland, will highlight the latest advances in analyzing, controlling, and understanding the influence of defects on material properties, reliability, and overall device performance.
The 21st DRIP Conference is organized jointly by leading Polish scientific institutions engaged in advanced semiconductor research and technology.
